1. Semiconductor G-line Photoresist Field:

Used in G-line (436nm) positive photoresists, suitable for micron-level pattern transfer on wafers in integrated circuit (IC) manufacturing, improving lithographic resolution and edge clarity, and meeting the fine processing requirements of semiconductor chip manufacturing.

2. Flat Panel Display Manufacturing Field:

Used in the photolithography process of thin-film transistor liquid crystal displays (TFT-LCDs), such as color filters, black matrices, and pixel definition layers, improving the imaging quality and resolution of display panels.

3. PCB Lithography and Dry Film Field:

Used in photoresists and dry films for printed circuit boards (PCBs), suitable for the fine line fabrication of high-density PCBs, enhancing photosensitivity and development accuracy, and improving the stability and chemical resistance of circuit patterns.

4. Printing Plate Making and Photosensitive Materials Field:

Used in lithographic printing plates, photosensitive resin plates, etc., to initiate photochemical reactions for pattern transfer, suitable for the fine processing of printing plates, improving the print durability and pattern clarity of printing plates.

5. Optical Materials and Microelectronics Field:

Used in optical films, photosensitive materials for photoresists, etc., as a photosensitizer to improve the photosensitivity and imaging quality of photosensitive systems, suitable for optical component manufacturing, microelectronics fine processing, and other processes.

6. Fine Chemical Synthesis Field:

Used as an organic synthesis intermediate for the synthesis of specific functional materials and fine chemicals, suitable for the construction of specific photosensitive molecular structures in laboratory research and industrial production.

7. Other Photosensitive Systems Fields:

Used in photolithography processes for microelectromechanical systems (MEMS), biochips, etc., suitable for various photosensitive systems and processing technologies, improving the processing accuracy and performance stability of microstructures.