1. Photoresist and Microelectronics Manufacturing

Used in the synthesis of photosensitizers for positive photoresists (such as DNQ-phenolic resin systems), acting as a photoacid generator/crosslinking component. It is suitable for fine pattern transfer in semiconductor chips and PCB circuit boards, improving lithographic resolution and development contrast, and is applicable to 248nm and above lithography processes.

2. Lithographic Printing and Plate Making

Used as a photosensitizer for PS plates (pre-coated photosensitive plates), achieving the formation of oleophilic/hydrophilic areas on the plate surface through photolysis reactions. It is suitable for offset printing, flexographic printing, and other printing plate making processes, improving plate durability and pattern clarity.

3. Dye and Pigment Synthesis

Used as an intermediate for azo dyes, for the synthesis of reactive dyes, acid dyes, and disperse dyes. It is suitable for coloring textiles, leather, plastics, and other substrates, improving dye color fastness and color intensity.

4. Photosensitive Resins and Photocurable Materials

Used in the synthesis of photosensitive resins and photoresists, suitable for PCB solder mask inks and photoresist auxiliary materials. As a photoresponsive component, it initiates crosslinking or decomposition, improving material photosensitivity and processing accuracy.

5. Fine Chemical Intermediates

Used to prepare derivative intermediates such as 2,1,5-sulfonyl chloride, which are further used in the synthesis of pharmaceuticals, pesticides, and functional materials. It is suitable for organic synthesis and fine chemical production, improving reaction selectivity and product purity.

6. Analytical Chemistry Reagents

Used as analytical reagents and chromogenic agents for specific ion detection and qualitative and quantitative analysis of organic compounds. It is suitable for laboratory chemical analysis and industrial quality inspection, improving detection sensitivity and accuracy.