1. Semiconductor Photoresist Field:

Used in I/G line positive photoresists, suitable for fine pattern transfer on wafers in integrated circuit (IC) manufacturing, improving lithographic resolution and edge clarity, meeting the processing requirements of micron/submicron lines, and compatible with semiconductor chip manufacturing processes.

2. PCB Lithography and Dry Film Field:

Used in photoresists and dry films for printed circuit boards (PCBs), especially suitable for the fabrication of fine lines in high-density PCBs, enhancing photosensitivity and development accuracy, improving the stability and chemical resistance of line patterns, and compatible with UV exposure systems.

3. Flat Panel Display Manufacturing Field:

Used in the photolithography process of flat panel display devices such as liquid crystal displays (LCDs) and organic light-emitting diodes (OLEDs), as a photosensitive agent in processes such as pixel definition layers and color filters, improving the resolution and image quality of display panels.

4. 인쇄판 제작 및 감광성 재료 분야:

Used in lithographic printing plates and photosensitive resin plates, initiating photochemical reactions to achieve pattern transfer, suitable for the fine processing of printing plates, improving the print durability and pattern clarity of printing plates.

5. Polymer Material Modification Field:

Used as a photosensitive crosslinking agent for polymer material modification, allowing for the control of the degree of crosslinking and performance of materials, suitable for the preparation of photocuring coatings and functional films, improving the weather resistance and stability of products.

6. Pharmaceutical and Fine Chemical Fields:

Used as an organic synthesis intermediate in the synthesis of pharmaceuticals and fine chemicals, it can be used as a prodrug or a photosensitive component in drug delivery systems, controlling the drug release rate, and suitable for laboratory research and specific industrial production.

7. 기타 감광성 시스템 필드:

Used in the photolithography process of microelectromechanical systems (MEMS) and biochips, compatible with various photosensitive systems and processing technologies, improving the processing accuracy and performance stability of microstructures, meeting the needs of fine processing and functional device manufacturing.