1. Semiconductor Photolithography Manufacturing:

As a key photoacid generator in chemically amplified photoresists, it is adapted for ultraviolet lithography processes and used in the fine pattern transfer of large-scale integrated circuits (LSI) manufacturing, ensuring high sensitivity and imaging accuracy of the photoresist.

2. Display Panel Photosensitive Materials:

Used in photosensitive resists for flat panel displays such as LCDs and OLEDs, it is applied in patterning processes for pixel definition layers, color filters, and touch panels, meeting the imaging requirements of high-resolution display devices.

3. PCB and Packaging Materials:

Used in photosensitive solder mask inks and inner/outer layer photoresists for PCB manufacturing, as well as underfill adhesives and damming materials for semiconductor packaging, it promotes photocuring and patterning, improving circuit accuracy and packaging reliability.

4. UV Curing Functional Materials:

As a cationic photoinitiator, it is used in UV-curing coatings, adhesives, 3D printing photopolymer resins, and other systems, initiating cationic polymerization of oligomers such as epoxides, achieving rapid material curing and enhancing chemical resistance and mechanical properties.

5. Organic Synthesis and Specialty Materials Development:

Used as a catalyst or reaction intermediate in organic synthesis, participating in etherification, arylation, and other reactions; it is also used in research fields such as novel photoresists and functional polymer materials, exploring photoresponsive systems and optimizing material properties.