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Photoresist and Photosensitive Materials

Explore DNQ photoactive compounds and their precursors, diazo materials and SBQ-related products for photosensitive formulations. The range includes 215C, 215S, 3215, 4215, PAC-TPPA, 3HBP and 4HBP.

Distinguish a synthesis intermediate from a finished photoactive compound when sourcing materials. For example, 3HBP and 4HBP are phenolic precursors for preparing DNQ derivatives. Confirm the reaction or formulation role, purity requirements and processing conditions for the selected grade.

Photoresist and Photosensitive Materials

Explore DNQ photoactive compounds and their precursors, diazo materials and SBQ-related products for photosensitive formulations. The range includes 215C, 215S, 3215, 4215, PAC-TPPA, 3HBP and 4HBP.

Distinguish a synthesis intermediate from a finished photoactive compound when sourcing materials. For example, 3HBP and 4HBP are phenolic precursors for preparing DNQ derivatives. Confirm the reaction or formulation role, purity requirements and processing conditions for the selected grade.

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NOSSO ENDEREÇO

Endereço da fábrica em Weifang: Changyi Longchang Bio-chemical Co., Ltd.

Zona de desenvolvimento de Shibu, cidade de Changyi, cidade de Weifang, província de Shangdong, China

Endereço em Jinan: Shandong Changhong Chemical Co., Ltd.

2411, Building 3, Aosheng Building, High-tech Zone, cidade de Jinan, província de Shandong.

Whatsapp: (+86)13256193735

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E-mail: info@changhongchemical.com

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