CHLUMICRYL® EO4-BPADA monomeer CAS 64401-02-1

Chemische naam: (4) geëthoxyleerd bisfenol A diacrylaat

CAS-nr.: 64401-02-1

Synoniemen:2,2-BIS[4-(2-ACRYLOXYETHOXY)FENYL]PROPAAN;Bis(4-acryloxypolyethoxyfenyl)propaan;BPA(4EO)DA;Fotomeer 4028 F;Laromeer PO 9114

MF: C25H28O6

Analyse: 98% min

Beschrijving

EO4-BPADA monomeer CAS 64401-02-1

Uiterlijk: transparante vloeistof
Kleur (APHA): ≤150
Zuurwaarde (mgkOH / g): ≤1.0
Viscositeit (cps @ 25 ℃): 800-1000
Vocht%: ≤0.2
Polymerisatie-inhibitor (ppm): ≤500
Brekingsindex: 1.537
Oppervlaktespanning Dynes / cm, 20 ℃: 42.1
De glasovergangstemperatuur Tg, ℃: 42

EO4-BPADA monomeer toepassingen: 

Houtcoatings, PVC-coatings, kunststofcoatings, metaalcoatings, offsetdrukinkten, flexodruk, zeefdruk, vernis

EO4-BPADA monomeer Verpakking en verzending:

Verpakking: trommel

Levering: binnen 5-7 werkdagen.

EO4-BPADA Monomeeropslag:

Wordt bewaard in een droog, schoon magazijn met goede ventilatie.

Vermijd blootstelling aan licht en verwarming.

Het product beschermen tegen lekkage, regen en insolatie tijdens transport.

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CHLUMICRYL® UV-functionele monomeren Acrylmonomeren

 

EO4-BPADA Monomer Application scenarios

1. UV-uithardende coatings:

Used in the preparation of UV-curable coatings for substrates such as metals, plastics, wood, and electronic components. These coatings cure rapidly to form high-hardness, chemically resistant, and strongly adhesive coatings, suitable for high-efficiency coating applications such as automotive refinishing paints, furniture topcoats, and electronic insulation paints.

2. Printing Inks and Solder Mask Inks:

Used as a key component in UV screen printing inks, flexographic inks, and PCB solder mask inks, improving curing speed, abrasion resistance, solvent resistance, and resolution, ensuring the clarity and durability of printed patterns.

3. UV-uithardende lijmen:

Used in the formulation of UV-curing adhesives, enhancing bonding strength, water resistance, and heat resistance. Suitable for structural bonding and encapsulation of materials such as glass, metals, and plastics, such as electronic component fixing and optical device assembly.

4. Fotolakken en elektronische materialen:

Used in the formulation of photoresists for semiconductors, PCB dry film photoresists, and display panel-related photoresists, improving the etch resistance, resolution, and thermal stability of photoresists, facilitating the processing and manufacturing of fine lines and patterns.

5. Polymer Material Crosslinking Modification:

Used as a crosslinking agent for the modification of polymer materials such as rubber and synthetic resins. A dense polymer network is constructed through photopolymerization or thermal polymerization, enhancing the mechanical strength, aging resistance, and dimensional stability of the materials.

6. Harsen voor 3D-printen:

Used in the formulation of photocurable 3D printing consumables, improving the accuracy, surface finish, and mechanical properties of printed parts. Suitable for high-precision 3D printing processes such as SLA and DLP, meeting the needs for rapid prototyping of models and functional parts.

7. Optical Material Preparation:

Used in the production of high-refractive index, low-shrinkage optical resins, applicable to optical lenses, fiber optic coatings, and optical fibers, ensuring the light transmission and structural stability of optical materials.

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