1. Semiconductor Photoresist Manufacturing:

As a key photoacid generator for chemically amplified photoresists, it is adapted for deep ultraviolet (DUV) lithography processes, used in large-scale integrated circuit (LSI) and advanced process chip manufacturing, ensuring high sensitivity and fine pattern transfer accuracy of photoresists, and improving chip yield.

2. Display Panel Photosensitive Materials:

Applied in the manufacturing of flat panel displays such as LCD and OLED, as a photosensitive resist for patterning processes in pixel definition layers, color filters, and touch panels, meeting the imaging requirements of high-resolution display devices.

3. Printed Circuit Board (PCB) and Packaging Materials:

Used in PCB manufacturing as photosensitive solder mask inks and inner/outer layer photoresists, as well as underfill and damming materials for semiconductor packaging, promoting photocuring and patterning, and improving circuit accuracy and packaging reliability.

4. UV Curing Functional Materials:

As a cationic photoinitiator, it is used in UV-curing coatings, adhesives, 3D printing photosensitive resins, and other systems, initiating cationic polymerization of oligomers such as epoxides, achieving rapid curing and molding of materials, and enhancing the chemical resistance and mechanical properties of products.

5. Organic Synthesis and Specialty Materials Development:

Used as a catalyst or reaction intermediate in organic synthesis, participating in etherification, arylation, and other reactions; also used in research fields such as novel photoresists and functional polymer materials, exploring photoresponsive systems and optimizing material properties.