{"id":225,"count":10,"description":"<p>Explore DNQ photoactive compounds and their precursors, diazo materials and SBQ-related products for photosensitive formulations. The range includes 215C, 215S, 3215, 4215, PAC-TPPA, 3HBP and 4HBP.<\/p><p>Distinguish a synthesis intermediate from a finished photoactive compound when sourcing materials. For example, 3HBP and 4HBP are phenolic precursors for preparing DNQ derivatives. Confirm the reaction or formulation role, purity requirements and processing conditions for the selected grade.<\/p>","link":"https:\/\/changhongchemical.com\/nl\/product-category\/photoinitiator\/photoresist-and-photosensitive-materials\/","name":"Photoresist and Photosensitive Materials","slug":"photoresist-and-photosensitive-materials","taxonomy":"product_cat","parent":174,"meta":[],"menu_order":0,"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v28.1 - https:\/\/yoast.com\/product\/yoast-seo-wordpress\/ -->\n<title>Photoresist and Photosensitive Materials | Changhong<\/title>\n<meta name=\"description\" content=\"Browse DNQ compounds, photoactive intermediates, diazo materials and SBQ. 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